Paper
23 April 1998 Direct observation of electron velocity overshoot in an InP p-i-n nanostructure semiconductor: a subpicosecond Raman probe
Kong-Thon F. Tsen, David K. Ferry, Jyh-Shyang Wang, Chao-Hsiung Huang, Hao-Hsiung Lin
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Abstract
We have studied transient electron transport in an InP p-i-n nanostructure semiconductor by subpicosecond Raman spectroscopy at T equals 300 K. Both the non-equilibrium electron distribution and electron drift velocity in the regime of electron velocity overshoot have been directly measured. It is demonstrated that electron drift velocity in an InP p-i-n nanostructure is significantly larger than that in a GaAs p-i-n nanostructure sample, as a result of the larger central to satellite valley energy separation in InP.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kong-Thon F. Tsen, David K. Ferry, Jyh-Shyang Wang, Chao-Hsiung Huang, and Hao-Hsiung Lin "Direct observation of electron velocity overshoot in an InP p-i-n nanostructure semiconductor: a subpicosecond Raman probe", Proc. SPIE 3277, Ultrafast Phenomena in Semiconductors II, (23 April 1998); https://doi.org/10.1117/12.306165
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KEYWORDS
Gallium arsenide

Electron transport

Nanostructures

Semiconductors

Surface plasmons

Raman spectroscopy

Raman scattering

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