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8 April 1998 GaN p-i-n photodiodes with high visible-to-ultraviolet rejection ratio
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UV photodetectors are critical components in many applications, including UV astronomy, flame sensors, early missile threat warning and space-to-space communications. Because of the presence of strong IR radiation in these situations, the photodetectors have to be solar blind, i.e. able to detect UV radiation while not being sensitive to IR. AlxGa1-xN is a promising material system for such devices. AlxGa1-xN materials are wide bandgap semiconductors, with a direct bandgap whose corresponding wavelength can be continuously tuned from 200 to 365 nm. AlxGa1-xN materials are thus insensitive to visible and IR radiation whose wavelengths are higher than 365 nm. We have already reported the fabrication and characterization of AlxGa1-xN- based photoconductors with a cut-off wavelength tunable from 200 to 365 nm by adjusting the ternary alloy composition. Here, we present the growth and characterization of GaN p-i- n photodiodes which exhibit a visible-to-UV rejection ratio of 6 orders or magnitude. The thin films were grown by low pressure metalorganic chemical vapor deposition. Square mesa structures were fabricated using dry etching, followed by contact metallization. The spectral response, rejection ratio and transient response of these photodiodes is reported.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Patrick Kung, Xiaolong Zhang, Danielle Walker, Adam W. Saxler, and Manijeh Razeghi "GaN p-i-n photodiodes with high visible-to-ultraviolet rejection ratio", Proc. SPIE 3287, Photodetectors: Materials and Devices III, (8 April 1998);


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