Fabrication of phase gratings in glass by ion implantation

Istvan Banyasz; Miklos Fried; Csaba Duecso; Zofia Vertesy; Csaba Hajdu

doi:10.1117/12.310575

18 June 1998 Fabrication of phase gratings in glass by ion implantation

Istvan Banyasz, Miklos Fried, Csaba Duecso, Zofia Vertesy, Csaba Hajdu

Proceedings Volume 3291, Diffractive and Holographic Device Technologies and Applications V; (1998) https://doi.org/10.1117/12.310575
Event: Optoelectronics and High-Power Lasers and Applications, 1998, San Jose, CA, United States

Abstract

Transmission phase gratings of grating constants of 4, 6, 8 and 12 micrometers have been designed and fabricated in glass samples via implantation of helium and nitrogen ions of energies in the 500 keV - 1.6 MeV range, through photoresist masks of thickness of 3.3 micrometers . Both mono- and multienergy implantations have been applied. The gratings have been studied by measuring the diffraction efficiencies. The phase profiles of the lines of the gratings have also been measured directly via interference and phase contrast microscopy and scanning electron microscopy. It was found that the profile of the implanted gratings differed significantly from the quasi rectangular profile of the mask, especially in case of the two finest gratings. The highest first order diffraction efficiencies were around 20%. The dependence of the efficiencies of the gratings on the energy and dose of the implantation have been measured.

Citation Download Citation

Istvan Banyasz, Miklos Fried, Csaba Duecso, Zofia Vertesy, and Csaba Hajdu "Fabrication of phase gratings in glass by ion implantation", Proc. SPIE 3291, Diffractive and Holographic Device Technologies and Applications V, (18 June 1998); https://doi.org/10.1117/12.310575

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