18 June 1998 Thermochemical technology of the layer-by-layer synthesis of multilevel chromium masks as precision molds for the phase shaping of high-efficiency large-aperture lenses
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Abstract
The new technology of the high-efficient large-aperture multilevel diffractive optical elements manufacture is examined. This technology is based on the properties of the laser thermochemical writing of hidden images in chromium films and possibilities of the circular laser photoplotter CLWS-300. The ultra-high resolution interferometric method is used for the hidden image precision alignment.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Valery P. Kiryanov, Alexander G. Verkhogliad, Leonid B. Kastorsky, Alexey V. Kiryanov, Vladimir I. Kozlov, "Thermochemical technology of the layer-by-layer synthesis of multilevel chromium masks as precision molds for the phase shaping of high-efficiency large-aperture lenses", Proc. SPIE 3291, Diffractive and Holographic Device Technologies and Applications V, (18 June 1998); doi: 10.1117/12.310590; https://doi.org/10.1117/12.310590
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KEYWORDS
Chromium

Etching

Photoresist materials

Diffractive optical elements

Reticles

Computer generated holography

Laser applications

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