26 March 1998 Surface relief gratings in self-developing photopolymer films
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Abstract
Dichromated poly(acrylic acid) (DCPAA) films with dimethyl formamide (DMF) have ben sued to photofabricate surface relief gratings. The formation of those gratings depends on the self-development time in darkness subsequent to the illumination at a wavelength of 442 nm and is obtained without any chemical treatment or wet processing. The modulation depth of those holographic surface relief gratings and the spatial frequency response of the thin DCPAA-DMF films have been chosen to characterize that self- developing photopolymer system. Those holographic characteristics are presented in this paper.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rene M. Beaulieu, Roger A. Lessard, Michel Bolte, and Detlef Kip "Surface relief gratings in self-developing photopolymer films", Proc. SPIE 3294, Holographic Materials IV, (26 March 1998); doi: 10.1117/12.304515; https://doi.org/10.1117/12.304515
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