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27 May 1982 Use Of Phase Measuring Interferometry In Quantity Production Of High Quality Optics
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Proceedings Volume 0330, Optical Systems Engineering II; (1982) https://doi.org/10.1117/12.934260
Event: 1982 Los Angeles Technical Symposium, 1982, Los Angeles, United States
Abstract
The advantages of Phase Measuring Interferometry (PMI) over conventional half-wave fringe contour measurements are well known. They include greater sensitivity through reduced fringe-to-fringe interval, ease of minimizing instrumental errors, shorter turnaround time to process results and data averaging to circumvent random environmental effects. Prior publications have described typical designs of PMI devices as well as some of their applications in the optical industry. At Perkin-Elmer, we have found that only through the use of advanced PMI technology can quantity production of very high quality optics be achieved on a timely and cost-effective basis. In this paper, we report some experiences with PMI as the primary method of in-process and final testing of a variety of optical components currently being manufactured in production quantity. Component apertures are as large as 47 cm. Measurements are typically made to precisions of the order of 0.01k (X/100) peak-to-peak and 0.001λ (λ/1000) rms. Examples include three types of reflecting optics of widely differing sizes and configurations: an Amici-type roof mirror, a concave spherical mirror and a convex spherical mirror.
© (1982) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
P. R. Yoder Jr., R. P. Grosso, and R. Crane "Use Of Phase Measuring Interferometry In Quantity Production Of High Quality Optics", Proc. SPIE 0330, Optical Systems Engineering II, (27 May 1982); https://doi.org/10.1117/12.934260
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