Paper
16 April 1998 Application of anisotropic conductive films for realization of interconnects in micromechanical structures
In-Byeong Kang, Malcolm R. Haskard, Noel D. Samaan
Author Affiliations +
Proceedings Volume 3321, 1996 Symposium on Smart Materials, Structures, and MEMS; (1998) https://doi.org/10.1117/12.305553
Event: Smart Materials, Structures and MEMS, 1996, Bangalore, India
Abstract
A new micromachining process, the application of an anisotropic conductive film (ACF) for micromechanical structures as well as interconnection both mechanically and electrically, is reported. The film acts as a spacer and adhesive as well as an electrical conductor in the vertical direction. The process provides very flexible design scheme and simple fabrication process. New micropump structure was proposed, and simple microstructures have been fabricated and tested successfully. The full details of experiment are reported, experiments where ACF type CP 7621 (Sony Chemical Co) was used to bond p type (100) silicon wafers.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
In-Byeong Kang, Malcolm R. Haskard, and Noel D. Samaan "Application of anisotropic conductive films for realization of interconnects in micromechanical structures", Proc. SPIE 3321, 1996 Symposium on Smart Materials, Structures, and MEMS, (16 April 1998); https://doi.org/10.1117/12.305553
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KEYWORDS
Semiconducting wafers

Polymers

Particles

Silicon

Wafer bonding

Resistance

Polymer thin films

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