20 July 1998 Thin/thick piezoelectric films by electrophoretic deposition
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Electrophoretic deposition (EPD) is a simple, rapid, and low cost method for producing conformal films on patterned electrodes. This paper covers the use of EPD for forming fully dense Lead Zirconate Titanate (PZT) films of twenty microns and less. The three main steps of this process as applied to PZT are covered: (1) formation of a charged suspension of the starting sub-micron PZT powder, (2) deposition of the powder particles on an electrode under the influence of a DC electric field, and (3) fluxing and constrained sintering of the resulting particulate deposit to form a dense continuous film. Using this process we have formed six to ten micron PZT films on an alumina substrate, sintered to fully density at 900°C. In a fourteen micron film we have achieved a piezoelectric d33 coefficient of 140 picoCoulombs/Newton, and a dielectric constant of 1,000 with a loss tan δ of 0.045.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jonathan Van Tassel, Jonathan Van Tassel, Clive A. Randall, Clive A. Randall, "Thin/thick piezoelectric films by electrophoretic deposition", Proc. SPIE 3324, Smart Structures and Materials 1998: Smart Materials Technologies, (20 July 1998); doi: 10.1117/12.316863; https://doi.org/10.1117/12.316863

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