5 June 1998 Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL
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Abstract
A method was developed to separate and quantitatively characterize a contribution of resist heating and proximity effects into CD-variation in electron-beam lithography. An experimental and theoretical study of these two effects were done using a 30 kV variably shaped beam system. TEMPTATION software tool was used to simulate temperature rise during electron exposures. Good agreement of experimental results and simulated data was found. A method was developed to measure proximity function which is free of resist heating influence.
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Sergey V. Babin, Sergey V. Babin, Peter Hudek, Peter Hudek, Ivan Kostic, Ivan Kostic, Igor Yu. Kuzmin, Igor Yu. Kuzmin, } "Comparative study of resist heating and proximity effect influence on CD variation in 30-kV EBL", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309629; https://doi.org/10.1117/12.309629
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