5 June 1998 National technology roadmap for semiconductors: an analysis and perspective
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Abstract
This paper presents a review and critique on the 1997 edition of the National Technology Roadmap for Semiconductors. The '97 roadmap provides more details and is more comprehensive than the 94-roadmap in many ways. However, there are areas where even more details and better definitions of terminologies are needed. This is especially important when one has to make comparative evaluations among the new generation of lithographic machines based upon their specification. There are also questions of the extent to which lithography could be and should be pushed in order to achieve smaller features; since at some stage the smaller features may reach their point of diminishing return due to RC delays in interconnects. The question is then what challenges lithography will face at 0.01 micrometers nodes and beyond.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Syed A. Rizvi, Syed A. Rizvi, } "National technology roadmap for semiconductors: an analysis and perspective", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309572; https://doi.org/10.1117/12.309572
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