Novel x-ray mask structure with low out-of-plane distortion

Young Jin Jeon; Sang-Soo Choi; Il Yong Kim; Hai Bin Chung; Bo Woo Kim

doi:10.1117/12.309607

5 June 1998 Novel x-ray mask structure with low out-of-plane distortion

Young Jin Jeon, Sang-Soo Choi, Il Yong Kim, Hai Bin Chung, Bo Woo Kim

Proceedings Volume 3331, Emerging Lithographic Technologies II; (1998) https://doi.org/10.1117/12.309607
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

During the process of an x-ray mask, anodic bonding makes the wafer to be distorted largely because of the difference between thermal coefficient of a wafer and Pyrex. A novel structure which has an additional wafer on the lower surface of Pyrex was suggested to reduce x-ray mask OPD and the case calculations have been made in this paper. For the structure used in this study, the x-ray mask OPD of the suggested structure was 4.456 micrometers . The effect of the additional wafer inner radius on the x-ray mask OPD was also presented.

Citation Download Citation

Young Jin Jeon, Sang-Soo Choi, Il Yong Kim, Hai Bin Chung, and Bo Woo Kim "Novel x-ray mask structure with low out-of-plane distortion", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); https://doi.org/10.1117/12.309607

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