5 June 1998 Recent advances in the Sandia EUV 10x microstepper
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Abstract
The Sandia EUV 10x microstepper system is the result of an evolutionary development process, starting with a simple 20x system, progressing through an earlier 10x system, to the current system that has full microstepper capabilities. The 10x microstepper prints 400-micrometers -diameter fields at sub- 0.10-micrometers resolution. Upgrades include the replacement of the copper wire target with a pulsed xenon jet target, construction of an improved projection optics system, the addition of a dose monitor a d an aerial image monitor, and the addition of a graphical user interface to the system operation software. This paper provides an up-to-date report on the status of the microstepper.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John E. M. Goldsmith, Pamela K. Barr, Kurt W. Berger, Luis J. Bernardez, Gregory Frank Cardinale, Joel R. Darnold, Daniel R. Folk, Steven J. Haney, Craig C. Henderson, Karen J. Jefferson, Kevin D. Krenz, Glenn D. Kubiak, Rodney P. Nissen, Donna J. O'Connell, Yon E. Perras, Avijit K. Ray-Chaudhuri, Tony G. Smith, Richard H. Stulen, Daniel A. Tichenor, Alfred A. Ver Berkmoes, John B. Wronosky, "Recent advances in the Sandia EUV 10x microstepper", Proc. SPIE 3331, Emerging Lithographic Technologies II, (5 June 1998); doi: 10.1117/12.309570; https://doi.org/10.1117/12.309570
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KEYWORDS
Extreme ultraviolet

Cameras

Imaging systems

Projection systems

Semiconducting wafers

Wavefronts

Extreme ultraviolet lithography

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