8 June 1998 Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films
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Abstract
Monte-Carlo simulation methods are used to investigate the glass transition temperature measurements from a scanning thermal microscopy study of thin photoresist films. We find that, consistent with our own experimental observations, film thickness has a profound effect on the glass transition temperature. Depending on whether the film is confined or not, we observe an increase or a decrease of the glass transition temperature. These findings are explained in terms of structural changes occurring at the molecular level.
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Fernando A. Escobedo, Fernando A. Escobedo, David S. Fryer, David S. Fryer, Juan J. de Pablo, Juan J. de Pablo, } "Application of scanning thermal microscopy to the study of thermophysical properties of ultrathin photoresist films", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308791; https://doi.org/10.1117/12.308791
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