Contamination monitoring for ammonia, amines, and acid gases utilizing ion mobility spectroscopy (IMS)

Tad Bacon; Kurt Webber; Ronald A. Carpio

doi:10.1117/12.308766

8 June 1998 Contamination monitoring for ammonia, amines, and acid gases utilizing ion mobility spectroscopy (IMS)

Tad Bacon, Kurt Webber, Ronald A. Carpio

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308766
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The effect of ammonia (NH₃) and n-methyl pyrrolidinone (NMP) contamination on chemically amplified DUV resists is well documented. Other amines and related compounds are under suspicion as well. In addition, the concentration levels that are of concern have steadily decreased from approximately 10 ppbv down to levels as low as 0.1 ppbv. While some techniques such as ion chromotagraphy (IC) have been demonstrated to have limits of detection at these levels, the analysis times are rather long and cumbersome. This paper describes the use of IMS to perform these measurements, in a totally automated, continuous instrument. IMS is a simplified time-of-flight technique that requires no liquid reagents and has been demonstrated to be a reliable method for monitoring for ammonia and NMP in cleanrooms. This paper demonstrates the ability of the technique to monitor for amines such as dimethylamine, methylamine, methanolamine, ethanolamine, diethanolamine, butylamine and others. Detection limits of 0.1 ppbv and below are clearly demonstrated. Also discussed are methods of monitoring multiple points with a single analyzer. Ability to detect corrosive gases such as hydrogen fluoride (HF), hydrogen chloride (HCl), sulfur dioxide (SO₂), sulfur trioxide (SO₃), nitrogen dioxide (NO₂), chlorine (Cl₂), bromine (Br₂), phosphoric acid (H₃PO₄) are also demonstrated.

Citation Download Citation

Tad Bacon, Kurt Webber, and Ronald A. Carpio "Contamination monitoring for ammonia, amines, and acid gases utilizing ion mobility spectroscopy (IMS)", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308766

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available