8 June 1998 Defect inspection of zero E-field border on i-line 9% PSM
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Abstract
In the photomask process, Zero E-field borders have been used on attenuated/embedded phase shift masks to provide an opaque area around the die area in the mask industry, but this border has never been able to be inspected on a laser scan inspection tool. This paper reports the first time that the Zero E-field has been inspected at DuPont Photomasks, Reticle Technology Center.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jerry Xiaoming Chen, Jerry Xiaoming Chen, Franklin D. Kalk, Franklin D. Kalk, } "Defect inspection of zero E-field border on i-line 9% PSM", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); doi: 10.1117/12.308741; https://doi.org/10.1117/12.308741
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