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8 June 1998 Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates
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Abstract
This paper investigates photoresist profiles on low reflectivity substrates with respect to numerical aperture and position in lens field. Results suggest a link between resist wall angle and substrate reflectivity which is influenced by lens aberrations.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Brian Martin, Graham G. Arthur, and Christine Wallace "Influence of lens aberrations on high-resolution imaging on low-reflectivity substrates", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308746
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