PROCEEDINGS VOLUME 3333
23RD ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY | 22-27 FEBRUARY 1998
Advances in Resist Technology and Processing XV
Editor(s): Will Conley
23RD ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
22-27 February 1998
Santa Clara, CA, United States
ArF Materials I
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 2 (29 June 1998); doi: 10.1117/12.312340
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 11 (29 June 1998); doi: 10.1117/12.312408
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 26 (29 June 1998); doi: 10.1117/12.312419
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 32 (29 June 1998); doi: 10.1117/12.312429
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 43 (29 June 1998); doi: 10.1117/12.312438
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 53 (29 June 1998); doi: 10.1117/12.312448
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 62 (29 June 1998); doi: 10.1117/12.312454
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 73 (29 June 1998); doi: 10.1117/12.312462
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 83 (29 June 1998); doi: 10.1117/12.312471
ArF Materials II
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 102 (29 June 1998); doi: 10.1117/12.312341
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 111 (29 June 1998); doi: 10.1117/12.312351
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 92 (29 June 1998); doi: 10.1117/12.312362
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 122 (29 June 1998); doi: 10.1117/12.312373
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 132 (29 June 1998); doi: 10.1117/12.312383
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 144 (29 June 1998); doi: 10.1117/12.312393
ArF Process
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 154 (29 June 1998); doi: 10.1117/12.312403
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 165 (29 June 1998); doi: 10.1117/12.312405
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 176 (29 June 1998); doi: 10.1117/12.312406
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 188 (29 June 1998); doi: 10.1117/12.312407
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 195 (29 June 1998); doi: 10.1117/12.312409
DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 206 (29 June 1998); doi: 10.1117/12.312410
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 219 (29 June 1998); doi: 10.1117/12.312411
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 228 (29 June 1998); doi: 10.1117/12.312412
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 236 (29 June 1998); doi: 10.1117/12.312413
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 245 (29 June 1998); doi: 10.1117/12.312414
DUV Process
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 256 (29 June 1998); doi: 10.1117/12.312415
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 268 (29 June 1998); doi: 10.1117/12.312416
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 278 (29 June 1998); doi: 10.1117/12.312417
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 289 (29 June 1998); doi: 10.1117/12.312418
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 301 (29 June 1998); doi: 10.1117/12.312420
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 313 (29 June 1998); doi: 10.1117/12.312421
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 324 (29 June 1998); doi: 10.1117/12.312422
Novolak Materials and Processes
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 336 (29 June 1998); doi: 10.1117/12.312423
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 347 (29 June 1998); doi: 10.1117/12.312424
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 357 (29 June 1998); doi: 10.1117/12.312425
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 366 (29 June 1998); doi: 10.1117/12.312426
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1052 (29 June 1998); doi: 10.1117/12.312427
Novolak Materials and Processes
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 384 (29 June 1998); doi: 10.1117/12.312428
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 820 (29 June 1998); doi: 10.1117/12.312430
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1061 (29 June 1998); doi: 10.1117/12.312431
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 830 (29 June 1998); doi: 10.1117/12.312432
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 837 (29 June 1998); doi: 10.1117/12.312433
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1382 (29 June 1998); doi: 10.1117/12.312434
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 448 (29 June 1998); doi: 10.1117/12.312435
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1390 (29 June 1998); doi: 10.1117/12.312436
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1272 (29 June 1998); doi: 10.1117/12.312437
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 534 (29 June 1998); doi: 10.1117/12.312439
Novolak Materials and Processes
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 376 (29 June 1998); doi: 10.1117/12.312440
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 845 (29 June 1998); doi: 10.1117/12.312441
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 860 (29 June 1998); doi: 10.1117/12.312442
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1280 (29 June 1998); doi: 10.1117/12.312443
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1406 (29 June 1998); doi: 10.1117/12.312444
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 546 (29 June 1998); doi: 10.1117/12.312445
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1069 (29 June 1998); doi: 10.1117/12.312446
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 869 (29 June 1998); doi: 10.1117/12.312447
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 454 (29 June 1998); doi: 10.1117/12.312449
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1081 (29 June 1998); doi: 10.1117/12.312450
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1092 (29 June 1998); doi: 10.1117/12.312451
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1288 (29 June 1998); doi: 10.1117/12.312452
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 644 (29 June 1998); doi: 10.1117/12.312453
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 880 (29 June 1998); doi: 10.1117/12.312455
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1103 (29 June 1998); doi: 10.1117/12.312456
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1115 (29 June 1998); doi: 10.1117/12.312457
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 554 (29 June 1998); doi: 10.1117/12.312458
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 655 (29 June 1998); doi: 10.1117/12.312459
Late-Breaking Developments
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 417 (29 June 1998); doi: 10.1117/12.312460
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 890 (29 June 1998); doi: 10.1117/12.312461
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 666 (29 June 1998); doi: 10.1117/12.312463
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 562 (29 June 1998); doi: 10.1117/12.312464
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1413 (29 June 1998); doi: 10.1117/12.312465
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 672 (29 June 1998); doi: 10.1117/12.312466
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 680 (29 June 1998); doi: 10.1117/12.312467
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 692 (29 June 1998); doi: 10.1117/12.312468
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 571 (29 June 1998); doi: 10.1117/12.312469
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 579 (29 June 1998); doi: 10.1117/12.312470
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 463 (29 June 1998); doi: 10.1117/12.312472
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 909 (29 June 1998); doi: 10.1117/12.312473
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1124 (29 June 1998); doi: 10.1117/12.312474
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1132 (29 June 1998); doi: 10.1117/12.312475
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1160 (29 June 1998); doi: 10.1117/12.312476
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 916 (29 June 1998); doi: 10.1117/12.312477
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 706 (29 June 1998); doi: 10.1117/12.312478
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 924 (29 June 1998); doi: 10.1117/12.312479
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 931 (29 June 1998); doi: 10.1117/12.312480
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 715 (29 June 1998); doi: 10.1117/12.312481
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 941 (29 June 1998); doi: 10.1117/12.312342
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 472 (29 June 1998); doi: 10.1117/12.312343
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1304 (29 June 1998); doi: 10.1117/12.312344
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1171 (29 June 1998); doi: 10.1117/12.312345
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1180 (29 June 1998); doi: 10.1117/12.312346
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1189 (29 June 1998); doi: 10.1117/12.312347
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 726 (29 June 1998); doi: 10.1117/12.312348
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1201 (29 June 1998); doi: 10.1117/12.312349
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 735 (29 June 1998); doi: 10.1117/12.312350
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 953 (29 June 1998); doi: 10.1117/12.312352
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1314 (29 June 1998); doi: 10.1117/12.312353
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 960 (29 June 1998); doi: 10.1117/12.312354
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1323 (29 June 1998); doi: 10.1117/12.312355
Late-Breaking Developments
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 425 (29 June 1998); doi: 10.1117/12.312356
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 747 (29 June 1998); doi: 10.1117/12.312357
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 758 (29 June 1998); doi: 10.1117/12.312358
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 587 (29 June 1998); doi: 10.1117/12.312359
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 484 (29 June 1998); doi: 10.1117/12.312360
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 493 (29 June 1998); doi: 10.1117/12.312361
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 595 (29 June 1998); doi: 10.1117/12.312363
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 503 (29 June 1998); doi: 10.1117/12.312364
Poster Session: ArF Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 601 (29 June 1998); doi: 10.1117/12.312365
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 611 (29 June 1998); doi: 10.1117/12.312366
Poster Session: Novolak-Based Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1337 (29 June 1998); doi: 10.1117/12.312367
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 972 (29 June 1998); doi: 10.1117/12.312368
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 987 (29 June 1998); doi: 10.1117/12.312369
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 997 (29 June 1998); doi: 10.1117/12.312370
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1212 (29 June 1998); doi: 10.1117/12.312371
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1420 (29 June 1998); doi: 10.1117/12.312372
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1218 (29 June 1998); doi: 10.1117/12.312374
Poster Session: DUV Processing
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1009 (29 June 1998); doi: 10.1117/12.312375
Poster Session: Novolak Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1232 (29 June 1998); doi: 10.1117/12.312376
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1241 (29 June 1998); doi: 10.1117/12.312377
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1251 (29 June 1998); doi: 10.1117/12.312378
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 768 (29 June 1998); doi: 10.1117/12.312379
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1426 (29 June 1998); doi: 10.1117/12.312380
Poster Session: ArF Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 512 (29 June 1998); doi: 10.1117/12.312381
Poster Session: DUV Materials
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 776 (29 June 1998); doi: 10.1117/12.312382
Poster Session: Aspects in Lithography
Proc. SPIE 3333, Advances in Resist Technology and Processing XV, pg 1436 (29 June 1998); doi: 10.1117/12.312384