29 June 1998 Advanced complementary color filter technology without dyeing process for CCD image sensors
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Abstract
Advanced complementary color filter technology without dyeing process has been developed to simplify color filter fabrication process and to improve UV-resistance and thermal stability of color filter for CCD image sensors and CMOS image sensors. Using this advanced technology, complementary color filter is able to be fabricated by conventional lithography process with usual TMAH developer. This technology has achieved fine resolution of less than 1.5 micrometers lines and spaces in spite of previous inclusion of complementary colorings within the photo-sensitive polymers. These photo-sensitive polymers are negative type and consist of five key elements. The performance of the color filter characteristics that UV-resistance is more than 30 million lux-hour and thermal stability is more than 250 degree(s)C, has been realized by the advanced technology. Consequently this technology has been applied to 1/4-inch CCD image sensors, the optical color characteristics of the CCD image sensors has been achieved nearly same and good color spectrums as the conventional one.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiromitsu Aoki, Hiromitsu Aoki, Kenji Yokozawa, Kenji Yokozawa, Nobuyuki Waga, Nobuyuki Waga, Tomoko Ohtagaki, Tomoko Ohtagaki, Yoshiaki Nishi, Yoshiaki Nishi, Hirotatsu Kodama, Hirotatsu Kodama, Yoshikazu Sano, Yoshikazu Sano, Sumio Terakawa, Sumio Terakawa, } "Advanced complementary color filter technology without dyeing process for CCD image sensors", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312376; https://doi.org/10.1117/12.312376
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