Chemical and lithographic aspects of organic deep-UV BARCs

Munirathna Padmanaban; Wen-Bing Kang; Ken Kimura; Yoshino Nishiwaki; Georg Pawlowski; Hatsuyuki Tanaka

doi:10.1117/12.312410

29 June 1998 Chemical and lithographic aspects of organic deep-UV BARCs

Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Yoshino Nishiwaki, Georg Pawlowski, Hatsuyuki Tanaka

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312410
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Bottom anti-reflective coatings (BARC) are useful to suppress the problems associated with reflection. In addition to matching the basic properties such as strong absorption at the exposure wavelength, and high etch rate, a commercially successful deep UV BARC material should be adaptable to as many chemically amplified resists as possible. A photoresist solvent compatible organic BARC material needs to have a minimum of two functions i.e., a dye to control the reflection, and a hardening agent or cross-linker to avoid intermixing with the resist cast on it. The dye and hardening components can be included to the BARC formulation in the form of additives or as an integral part of the polymer. We have designed novel BARC materials containing the dye and hardening function in the same polymer. Optionally, a third function can be incorporated to optimize the etch and solubility characteristics.

Citation Download Citation

Munirathna Padmanaban, Wen-Bing Kang, Ken Kimura, Yoshino Nishiwaki, Georg Pawlowski, and Hatsuyuki Tanaka "Chemical and lithographic aspects of organic deep-UV BARCs", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312410

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