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29 June 1998E-beam and deep-UV exposure of PMMA-based resists: identical or different chemical behavior?
A. Uhl,1 Juergen Bendig,2 J. Leistner,2 Ulrich A. Jagdhold,3 Joachim J. Bauer3
1Humboldt Univ. Berlin (FRG) and Institute for Semiconductor Physics (Germany) 2Humboldt Univ. Berlin (Germany) 3Institute for Semiconductor Physics (Germany)
The chemical reactions and the dissolution properties of homopolymeric PMMA and a P(MMA-co-MAA) copolymer were investigated during DUV (KrF, 248 nm) and e-beam exposure. The chain scission reaction was analyzed using GPC. The polymer degradation reaction is very similar at both exposure procedures. In both cases a bimodal and, later, a multimodal character of the molecular weight distribution is observed.
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A. Uhl, Juergen Bendig, J. Leistner, Ulrich A. Jagdhold, Joachim J. Bauer, "E-beam and deep-UV exposure of PMMA-based resists: identical or different chemical behavior?," Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312404