Lithographic evaluation of a new high-performance photoresist composition

Warren Montgomery; Neal P. Callan; Alan E. Kozlowski

doi:10.1117/12.312353

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29 June 1998 Lithographic evaluation of a new high-performance photoresist composition

Warren Montgomery, Neal P. Callan, Alan E. Kozlowski

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Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312353
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

`Non-critical' levels such as implant layer consume a large volume of photoresist. This work was done to choose a cost- effective, high performance implant resist implant resist. IN addition to resolution considerations, outgassing during implant, speed and cost were all evaluated to choose the successful candidate. Through this effort a new resist formulation, Sumiresist^TM PFM-10 was compared with other existing I-line formulations.

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Warren Montgomery, Neal P. Callan, and Alan E. Kozlowski "Lithographic evaluation of a new high-performance photoresist composition", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312353

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