New design principle for the PACs of novolak resists

Salil Jha; Arnost Reiser

doi:10.1117/12.312440

29 June 1998 New design principle for the PACs of novolak resists

Salil Jha, Arnost Reiser

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312440
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The inhibitor function and the photoreactive functions of the PACs of dissolution inhibition resists are independent of each other, and new PACs may be designed by joining strong inhibitors to conventional DNQs, provided the acceptor groups of the inhibitors are within reach of the thermal pulse emanating from the DNQ on exposure. The strength of inhibitors depends on the basicity of their acceptor groups, and that can be affected by substitution, by restructuring the acceptor group proper, and by increasing the size of the aromatic units attached to it.

Citation Download Citation

Salil Jha and Arnost Reiser "New design principle for the PACs of novolak resists", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312440

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