29 June 1998 Optimization of optical parameters for a critical i-line resist system
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Abstract
Optimized optical parameters can enhance the performance of resist systems. Expanded process latitudes can be achieved through the manipulation of the optical levers on a variable parameter stepper, extending a resist system's capability over a wider range of applications. In this study, the parameters being examined are numerical aperture, partial coherence and annularity. A 33 experiment of the optical factors was performed to screen for interactions between factors and to establish a resist model which can characterize behavior over the design space. Responses include energy to clear (Eo), sizing energy (Es), sizing ratio (Es/Eo), Iso/Dense bias, masking linearity, resolution, exposure latitude, focus latitude, and feature profile. Equations are presented to predict resist performance of selected responses for dense lines/spaces, isolated lines, trenches and contact holes. Optical parameter combinations are cited to optimize performance of individual features.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rosemary Bell, Rosemary Bell, } "Optimization of optical parameters for a critical i-line resist system", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312476; https://doi.org/10.1117/12.312476
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