Process effects resulting from conversion to a safe-solvent organic BARC

James C. Cox; Lynn Welsh; Deborah Murphy; Ronald J. Eakin; Pierre Silvestre; Ralph R. Dammel; Shuji Ding; Brad Williams; Dinesh N. Khanna

doi:10.1117/12.312394

29 June 1998 Process effects resulting from conversion to a safe-solvent organic BARC

James C. Cox, Lynn Welsh, Deborah Murphy, Ronald J. Eakin, Pierre Silvestre, Ralph R. Dammel, Shuji Ding, Brad Williams, Dinesh N. Khanna

Author Affiliations +

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312394
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The use of bottom antireflective coatings (BARCs) as a means for controlling substrate reflectivity and thin film effects, has become commonplace in today's wafer fabs. In an effort to simplify process integration, reduce environmental impact, and reduce processing costs, some next generation organic BARC materials have recently been introduced which are formulated with photoresist compatible solvent systems. This study examines the process effects of converting from the cyclohexanone based AZ^TM BARLi^TM anti-reflective coating, to the recently introduced PGME/Ethyl Lactate based AZ^TM BARLi^TM II anti-reflective coating. We will present a comparison of the optical properties of the two products, and examine i-line lithographic process effects including process latitudes, CD distributions, and coat defects, as well as post etch CD distributions, and dye sublimation during cure.

Citation Download Citation

James C. Cox, Lynn Welsh, Deborah Murphy, Ronald J. Eakin, Pierre Silvestre, Ralph R. Dammel, Shuji Ding, Brad Williams, and Dinesh N. Khanna "Process effects resulting from conversion to a safe-solvent organic BARC", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312394

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