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29 June 1998 Process effects resulting from conversion to a safe-solvent organic BARC
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The use of bottom antireflective coatings (BARCs) as a means for controlling substrate reflectivity and thin film effects, has become commonplace in today's wafer fabs. In an effort to simplify process integration, reduce environmental impact, and reduce processing costs, some next generation organic BARC materials have recently been introduced which are formulated with photoresist compatible solvent systems. This study examines the process effects of converting from the cyclohexanone based AZTM BARLiTM anti-reflective coating, to the recently introduced PGME/Ethyl Lactate based AZTM BARLiTM II anti-reflective coating. We will present a comparison of the optical properties of the two products, and examine i-line lithographic process effects including process latitudes, CD distributions, and coat defects, as well as post etch CD distributions, and dye sublimation during cure.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
James C. Cox, Lynn Welsh, Deborah Murphy, Ronald J. Eakin, Pierre Silvestre, Ralph R. Dammel, Shuji Ding, Brad Williams, and Dinesh N. Khanna "Process effects resulting from conversion to a safe-solvent organic BARC", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998);

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