Processing of acrylate-based 193-nm resists: influence of physico-chemical properties

Benedicte P. Mortini; Charles Rosilio; Alain Prola; Patrick Jean Paniez

doi:10.1117/12.312406

29 June 1998 Processing of acrylate-based 193-nm resists: influence of physico-chemical properties

Benedicte P. Mortini, Charles Rosilio, Alain Prola, Patrick Jean Paniez

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312406
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The large variety of protecting groups that can be employed for acrylate based resists increases the number of mechanisms encountered when implementing these new materials. Some of these phenomena, related to both their physical and chemical properties, are investigated.

Citation Download Citation

Benedicte P. Mortini, Charles Rosilio, Alain Prola, and Patrick Jean Paniez "Processing of acrylate-based 193-nm resists: influence of physico-chemical properties", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312406

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