29 June 1998 Processing of acrylate-based 193-nm resists: influence of physico-chemical properties
Author Affiliations +
Abstract
The large variety of protecting groups that can be employed for acrylate based resists increases the number of mechanisms encountered when implementing these new materials. Some of these phenomena, related to both their physical and chemical properties, are investigated.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Benedicte P. Mortini, Charles Rosilio, Alain Prola, Patrick Jean Paniez, "Processing of acrylate-based 193-nm resists: influence of physico-chemical properties", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312406; https://doi.org/10.1117/12.312406
PROCEEDINGS
12 PAGES


SHARE
Back to Top