29 June 1998 Resin fractionation effect for photoresist performance
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Abstract
Two different kinds of novolak resins are synthesized, one is a typical meta-cresol and para-cresol formaldehyde novolak resin and the other is a higher performance novolak resin, and which are fractionated into different molecular weight distributions. I-line photoresists with these different molecular weight distribution novolak resins are formulated and I-line photoresist performance is evaluated based on the Mw/Mn. From these consequence, it is found novolak resin has an optimum Mw/Mn value in the improvement of resolution and the improvement with resin fractionation is less than with different kind of novolak resin.
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Tatsuya Yamada, Tatsuya Yamada, Yutaka Saito, Yutaka Saito, Kunio Itoh, Kunio Itoh, } "Resin fractionation effect for photoresist performance", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); doi: 10.1117/12.312446; https://doi.org/10.1117/12.312446
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