Study of bake mechanisms by real-time in-situ ellipsometry

Patrick Jean Paniez; Aime Vareille; Patrice Ballet; Benedicte P. Mortini

doi:10.1117/12.312418

29 June 1998 Study of bake mechanisms by real-time in-situ ellipsometry

Patrick Jean Paniez, Aime Vareille, Patrice Ballet, Benedicte P. Mortini

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312418
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Film formation and bake processes have been studied using in-situ ellipsometry. This new experimental set-up based on a HeNe laser mounted over a hot-plate is shown to be mainly sensitive to physical changes in the resist layer and provides real-time monitoring of the modifications induced during bake steps. Pure polymer films as well as DUV 248 nm and 193 nm CA resists are investigated.

Citation Download Citation

Patrick Jean Paniez, Aime Vareille, Patrice Ballet, and Benedicte P. Mortini "Study of bake mechanisms by real-time in-situ ellipsometry", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312418

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