23RD ANNUAL INTERNATIONAL SYMPOSIUM ON MICROLITHOGRAPHY
22-27 February 1998
Santa Clara, CA, United States
Phase-Shifting Masks
Proc. SPIE 3334, Optical Microlithography XI, pg 2 (29 June 1998); doi: 10.1117/12.310717
Proc. SPIE 3334, Optical Microlithography XI, pg 15 (29 June 1998); doi: 10.1117/12.310750
Proc. SPIE 3334, Optical Microlithography XI, pg 25 (29 June 1998); doi: 10.1117/12.310761
Proc. SPIE 3334, Optical Microlithography XI, pg 36 (29 June 1998); doi: 10.1117/12.310770
Proc. SPIE 3334, Optical Microlithography XI, pg 46 (29 June 1998); doi: 10.1117/12.310780
CD Control Scanners
Proc. SPIE 3334, Optical Microlithography XI, pg 56 (29 June 1998); doi: 10.1117/12.310789
Proc. SPIE 3334, Optical Microlithography XI, pg 67 (29 June 1998); doi: 10.1117/12.310802
Proc. SPIE 3334, Optical Microlithography XI, pg 77 (29 June 1998); doi: 10.1117/12.310813
Mask CD Effects and OPC I
Proc. SPIE 3334, Optical Microlithography XI, pg 106 (29 June 1998); doi: 10.1117/12.310718
Proc. SPIE 3334, Optical Microlithography XI, pg 117 (29 June 1998); doi: 10.1117/12.310727
Proc. SPIE 3334, Optical Microlithography XI, pg 124 (29 June 1998); doi: 10.1117/12.310737
Proc. SPIE 3334, Optical Microlithography XI, pg 131 (29 June 1998); doi: 10.1117/12.310743
Lithography Modeling
Proc. SPIE 3334, Optical Microlithography XI, pg 142 (29 June 1998); doi: 10.1117/12.310744
Proc. SPIE 3334, Optical Microlithography XI, pg 154 (29 June 1998); doi: 10.1117/12.310745
Proc. SPIE 3334, Optical Microlithography XI, pg 164 (29 June 1998); doi: 10.1117/12.310746
Proc. SPIE 3334, Optical Microlithography XI, pg 176 (29 June 1998); doi: 10.1117/12.310747
Proc. SPIE 3334, Optical Microlithography XI, pg 197 (29 June 1998); doi: 10.1117/12.310748
OPC II
Proc. SPIE 3334, Optical Microlithography XI, pg 204 (29 June 1998); doi: 10.1117/12.310749
Proc. SPIE 3334, Optical Microlithography XI, pg 215 (29 June 1998); doi: 10.1117/12.310751
Proc. SPIE 3334, Optical Microlithography XI, pg 224 (29 June 1998); doi: 10.1117/12.310752
Proc. SPIE 3334, Optical Microlithography XI, pg 234 (29 June 1998); doi: 10.1117/12.310753
Proc. SPIE 3334, Optical Microlithography XI, pg 245 (29 June 1998); doi: 10.1117/12.310754
Image Quality
Proc. SPIE 3334, Optical Microlithography XI, pg 256 (29 June 1998); doi: 10.1117/12.310755
Proc. SPIE 3334, Optical Microlithography XI, pg 269 (29 June 1998); doi: 10.1117/12.310756
Proc. SPIE 3334, Optical Microlithography XI, pg 281 (29 June 1998); doi: 10.1117/12.310757
Proc. SPIE 3334, Optical Microlithography XI, pg 289 (29 June 1998); doi: 10.1117/12.310758
Proc. SPIE 3334, Optical Microlithography XI, pg 297 (29 June 1998); doi: 10.1117/12.310759
Antireflective Layers
Proc. SPIE 3334, Optical Microlithography XI, pg 310 (29 June 1998); doi: 10.1117/12.310760
Proc. SPIE 3334, Optical Microlithography XI, pg 322 (29 June 1998); doi: 10.1117/12.310762
Proc. SPIE 3334, Optical Microlithography XI, pg 337 (29 June 1998); doi: 10.1117/12.310763
Proc. SPIE 3334, Optical Microlithography XI, pg 347 (29 June 1998); doi: 10.1117/12.310764
Proc. SPIE 3334, Optical Microlithography XI, pg 356 (29 June 1998); doi: 10.1117/12.310765
Process Optimization and Enhancement Techniques
Proc. SPIE 3334, Optical Microlithography XI, pg 372 (29 June 1998); doi: 10.1117/12.310766
Proc. SPIE 3334, Optical Microlithography XI, pg 384 (29 June 1998); doi: 10.1117/12.310767
Proc. SPIE 3334, Optical Microlithography XI, pg 406 (29 June 1998); doi: 10.1117/12.310768
Advanced Exposure Tools
Proc. SPIE 3334, Optical Microlithography XI, pg 414 (29 June 1998); doi: 10.1117/12.310769
Proc. SPIE 3334, Optical Microlithography XI, pg 423 (29 June 1998); doi: 10.1117/12.310771
Proc. SPIE 3334, Optical Microlithography XI, pg 437 (29 June 1998); doi: 10.1117/12.310772
Proc. SPIE 3334, Optical Microlithography XI, pg 448 (29 June 1998); doi: 10.1117/12.310773
Proc. SPIE 3334, Optical Microlithography XI, pg 460 (29 June 1998); doi: 10.1117/12.310774
193-nm Issues and Alignment
Proc. SPIE 3334, Optical Microlithography XI, pg 470 (29 June 1998); doi: 10.1117/12.310775
Proc. SPIE 3334, Optical Microlithography XI, pg 480 (29 June 1998); doi: 10.1117/12.310776
Proc. SPIE 3334, Optical Microlithography XI, pg 496 (29 June 1998); doi: 10.1117/12.310777
Proc. SPIE 3334, Optical Microlithography XI, pg 502 (29 June 1998); doi: 10.1117/12.310778
Proc. SPIE 3334, Optical Microlithography XI, pg 510 (29 June 1998); doi: 10.1117/12.310779
Poster Session I: Enhancement Techniques
Proc. SPIE 3334, Optical Microlithography XI, pg 522 (29 June 1998); doi: 10.1117/12.310781
Proc. SPIE 3334, Optical Microlithography XI, pg 532 (29 June 1998); doi: 10.1117/12.310782
Proc. SPIE 3334, Optical Microlithography XI, pg 543 (29 June 1998); doi: 10.1117/12.310783
Proc. SPIE 3334, Optical Microlithography XI, pg 553 (29 June 1998); doi: 10.1117/12.310784
Proc. SPIE 3334, Optical Microlithography XI, pg 559 (29 June 1998); doi: 10.1117/12.310785
Proc. SPIE 3334, Optical Microlithography XI, pg 567 (29 June 1998); doi: 10.1117/12.310786
Proc. SPIE 3334, Optical Microlithography XI, pg 579 (29 June 1998); doi: 10.1117/12.310787
Proc. SPIE 3334, Optical Microlithography XI, pg 590 (29 June 1998); doi: 10.1117/12.310788
Poster Session II: CD Control
Proc. SPIE 3334, Optical Microlithography XI, pg 598 (29 June 1998); doi: 10.1117/12.310790
Proc. SPIE 3334, Optical Microlithography XI, pg 607 (29 June 1998); doi: 10.1117/12.310791
Proc. SPIE 3334, Optical Microlithography XI, pg 620 (29 June 1998); doi: 10.1117/12.310792
Proc. SPIE 3334, Optical Microlithography XI, pg 629 (29 June 1998); doi: 10.1117/12.310793
CD Control Scanners
Proc. SPIE 3334, Optical Microlithography XI, pg 92 (29 June 1998); doi: 10.1117/12.310794
Poster Session III: Advanced Masks
Proc. SPIE 3334, Optical Microlithography XI, pg 642 (29 June 1998); doi: 10.1117/12.310795
Proc. SPIE 3334, Optical Microlithography XI, pg 649 (29 June 1998); doi: 10.1117/12.310796
Poster Session IV: Process Optimization
Proc. SPIE 3334, Optical Microlithography XI, pg 660 (29 June 1998); doi: 10.1117/12.310797
Proc. SPIE 3334, Optical Microlithography XI, pg 673 (29 June 1998); doi: 10.1117/12.310798
Poster Session V: Reflection Effects
Proc. SPIE 3334, Optical Microlithography XI, pg 680 (29 June 1998); doi: 10.1117/12.310799
Proc. SPIE 3334, Optical Microlithography XI, pg 685 (29 June 1998); doi: 10.1117/12.310800
Proc. SPIE 3334, Optical Microlithography XI, pg 692 (29 June 1998); doi: 10.1117/12.310801
Poster Session VI: Simulation
Proc. SPIE 3334, Optical Microlithography XI, pg 704 (29 June 1998); doi: 10.1117/12.310803
Proc. SPIE 3334, Optical Microlithography XI, pg 714 (29 June 1998); doi: 10.1117/12.310804
Proc. SPIE 3334, Optical Microlithography XI, pg 717 (29 June 1998); doi: 10.1117/12.310805
Proc. SPIE 3334, Optical Microlithography XI, pg 729 (29 June 1998); doi: 10.1117/12.310806
Proc. SPIE 3334, Optical Microlithography XI, pg 739 (29 June 1998); doi: 10.1117/12.310807
Proc. SPIE 3334, Optical Microlithography XI, pg 752 (29 June 1998); doi: 10.1117/12.310808
Proc. SPIE 3334, Optical Microlithography XI, pg 764 (29 June 1998); doi: 10.1117/12.310809
Proc. SPIE 3334, Optical Microlithography XI, pg 777 (29 June 1998); doi: 10.1117/12.310810
Proc. SPIE 3334, Optical Microlithography XI, pg 785 (29 June 1998); doi: 10.1117/12.310811
Proc. SPIE 3334, Optical Microlithography XI, pg 795 (29 June 1998); doi: 10.1117/12.310812
Proc. SPIE 3334, Optical Microlithography XI, pg 803 (29 June 1998); doi: 10.1117/12.310814
Proc. SPIE 3334, Optical Microlithography XI, pg 814 (29 June 1998); doi: 10.1117/12.310815
Proc. SPIE 3334, Optical Microlithography XI, pg 820 (29 June 1998); doi: 10.1117/12.310816
Poster Session VII: Image Quality
Proc. SPIE 3334, Optical Microlithography XI, pg 832 (29 June 1998); doi: 10.1117/12.310817
Proc. SPIE 3334, Optical Microlithography XI, pg 839 (29 June 1998); doi: 10.1117/12.310818
Proc. SPIE 3334, Optical Microlithography XI, pg 848 (29 June 1998); doi: 10.1117/12.310819
Proc. SPIE 3334, Optical Microlithography XI, pg 855 (29 June 1998); doi: 10.1117/12.310820
Proc. SPIE 3334, Optical Microlithography XI, pg 868 (29 June 1998); doi: 10.1117/12.310821
Poster Session VIII: OPC
Proc. SPIE 3334, Optical Microlithography XI, pg 874 (29 June 1998); doi: 10.1117/12.310822
Proc. SPIE 3334, Optical Microlithography XI, pg 885 (29 June 1998); doi: 10.1117/12.310823
Proc. SPIE 3334, Optical Microlithography XI, pg 892 (29 June 1998); doi: 10.1117/12.310719
Proc. SPIE 3334, Optical Microlithography XI, pg 912 (29 June 1998); doi: 10.1117/12.310720
Proc. SPIE 3334, Optical Microlithography XI, pg 921 (29 June 1998); doi: 10.1117/12.310721
Proc. SPIE 3334, Optical Microlithography XI, pg 932 (29 June 1998); doi: 10.1117/12.310722
Poster Session IX: Exposure Tools and Subsystems
Proc. SPIE 3334, Optical Microlithography XI, pg 940 (29 June 1998); doi: 10.1117/12.310723
Proc. SPIE 3334, Optical Microlithography XI, pg 951 (29 June 1998); doi: 10.1117/12.310724
Proc. SPIE 3334, Optical Microlithography XI, pg 958 (29 June 1998); doi: 10.1117/12.310725
Proc. SPIE 3334, Optical Microlithography XI, pg 986 (29 June 1998); doi: 10.1117/12.310726
Proc. SPIE 3334, Optical Microlithography XI, pg 997 (29 June 1998); doi: 10.1117/12.310728
Proc. SPIE 3334, Optical Microlithography XI, pg 1005 (29 June 1998); doi: 10.1117/12.310729
Proc. SPIE 3334, Optical Microlithography XI, pg 1010 (29 June 1998); doi: 10.1117/12.310730
Proc. SPIE 3334, Optical Microlithography XI, pg 1014 (29 June 1998); doi: 10.1117/12.310731
Proc. SPIE 3334, Optical Microlithography XI, pg 1021 (29 June 1998); doi: 10.1117/12.310732
Proc. SPIE 3334, Optical Microlithography XI, pg 1031 (29 June 1998); doi: 10.1117/12.310733
Proc. SPIE 3334, Optical Microlithography XI, pg 1041 (29 June 1998); doi: 10.1117/12.310734
Proc. SPIE 3334, Optical Microlithography XI, pg 1048 (29 June 1998); doi: 10.1117/12.310735
Proc. SPIE 3334, Optical Microlithography XI, pg 1055 (29 June 1998); doi: 10.1117/12.310736
Proc. SPIE 3334, Optical Microlithography XI, pg 971 (29 June 1998); doi: 10.1117/12.310738
Process Optimization and Enhancement Techniques
Proc. SPIE 3334, Optical Microlithography XI, pg 395 (29 June 1998); doi: 10.1117/12.310739
Poster Session IX: Exposure Tools and Subsystems
Proc. SPIE 3334, Optical Microlithography XI, pg 978 (29 June 1998); doi: 10.1117/12.310740
Proc. SPIE 3334, Optical Microlithography XI, pg 1062 (29 June 1998); doi: 10.1117/12.310741
Proc. SPIE 3334, Optical Microlithography XI, pg 1074 (29 June 1998); doi: 10.1117/12.310742
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