0.18-um optical lithography performances using an alternating DUV phase-shift mask

Yorick Trouiller; N. Buffet; Thierry Mourier; Patrick Schiavone; Yves Quere

doi:10.1117/12.310761

29 June 1998 0.18-μm optical lithography performances using an alternating DUV phase-shift mask

Yorick Trouiller, N. Buffet, Thierry Mourier, Patrick Schiavone, Yves Quere

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310761
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The phase shift mask (PSM) is a key emerging technology thought to be extending 248 nm lithography. In this paper, we describe the lithographic performances of Shipley UV5 photoresist on SiOxNy Bottom Anti Reflective coating (BARC), using alternating PSM and ASM/90 Deep-UV stepper. Results on 0.18 micrometer design rules are presented: lithographic performances, comparison between PSM and binary mask, sub 0.18 micrometer performances ({1}) and the ultimate resolution of this technology are reported. To conclude we demonstrated the 0.18 micrometer lithography feasibility with alternating mask and KrF stepper, and showed that all the necessary tools are today available to achieve such goals.

Citation Download Citation

Yorick Trouiller, N. Buffet, Thierry Mourier, Patrick Schiavone, and Yves Quere "0.18-μm optical lithography performances using an alternating DUV phase-shift mask", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310761

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