29 June 1998 High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge
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Abstract
We present the performance and durability of the newest model of the KrF excimer laser for microlithography KLES-G10K. The laser achieves 10 W of output power with 0.7 pm bandwidth at 1000 Hz with newly developed solid state pulsed power module and the high precise narrowing module. The durability of laser tube achieves 5 billion pulses with the new radio frequency preionization scheme, which reduces consumption of fluorine gas and maintenance of laser tube drastically.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tatsuo Enami, Tatsuo Enami, Osamu Wakabayashi, Osamu Wakabayashi, Toshihiro Nishisaka, Toshihiro Nishisaka, Natsushi Suzuki, Natsushi Suzuki, Takashi Nire, Takashi Nire, Hakaru Mizoguchi, Hakaru Mizoguchi, Hiroaki Nakarai, Hiroaki Nakarai, Hirokazu Tanaka, Hirokazu Tanaka, Tatsuya Ariga, Tatsuya Ariga, Kouji Shio, Kouji Shio, Takeshi Okamoto, Takeshi Okamoto, Ryoichi Nodomi, Ryoichi Nodomi, Hitoshi Tomaru, Hitoshi Tomaru, Kiyoharu Nakao, Kiyoharu Nakao, } "High-spectral-purity and high-durability kHz KrF excimer laser with advanced rf preionization discharge", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310733; https://doi.org/10.1117/12.310733
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