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29 June 1998 Lithography simulation employing rigorous solutions to Maxwell's equations
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Abstract
A method of obtaining rigorous solutions to Maxwell's equations for the transmission of light through a photomask, both chrome-based and phase-shifting, is presented. The electromagnetic simulator will predict the transmission of light through the mask taking into account material properties, width, and thickness of the structures on the mask. This electromagnetic simulation will then be incorporated into the software package PROLITH/2 for complete simulation down to the resist level. Examples of lithography simulation using these rigorous solutions will be presented.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald L. Gordon and Chris A. Mack "Lithography simulation employing rigorous solutions to Maxwell's equations", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310747
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