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29 June 1998 New method for improving the practical resolution of complex patterns in sub-half-micron lithography
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Abstract
A new approach, based on the optimization of illumination light by micro-optical element, is applied to improve the practical resolution of complex pattern in sub-half micron lithography. Several micro optical plates are devised to optimize the illumination light. Through the detailed theoretical expansion of the optics for the new structure, simulation of the aerial image is carried out. And the experiments verify the results of simulation.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xunan Chen, Xiangang Luo, HanMin Yao, Qian Xiao, and Guobin Yu "New method for improving the practical resolution of complex patterns in sub-half-micron lithography", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310786
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