Novel approximate model for resist process

Chang-Nam Ahn; Hee-Bom Kim; Ki-Ho Baik

doi:10.1117/12.310808

29 June 1998 Novel approximate model for resist process

Chang-Nam Ahn, Hee-Bom Kim, Ki-Ho Baik

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310808
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Optical proximity correction technique has been studied. The occurrence of proximity effect in the optical lithography is composed of an element caused by diffraction of light, which can be explained by aerial image simulation, and an element caused by resist process, in which acid diffusion is a major factor causing non-linearity. In the case of very thin resist, absorbed energy that generates the acid can be described by two-dimensional instead of three-dimensional distribution. Under this simple assumption, acid diffusion by post exposure bake is equivalent to the diffusion of aerial image, and chemical amplification can be analytically described also. Modified aerial image including diffusion and chemical amplification, we call it diffused aerial image, can give the information for patterning status directly. Therefore, diffused aerial image model can explain experimental results very well compared to the expectation by using aerial image only without loss of simplicity and calculation speed.

Citation Download Citation

Chang-Nam Ahn, Hee-Bom Kim, and Ki-Ho Baik "Novel approximate model for resist process", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310808

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available