Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition

In-Ho Park; Hye-Keun Oh; S. B. Hyun

doi:10.1117/12.310741

29 June 1998 Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition

In-Ho Park, Hye-Keun Oh, S. B. Hyun

Author Affiliations +

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310741
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

A method for simulating latent image formation in a photoresist illuminated by an arbitrary imaging system is presented. The perfectly matched layer absorbing boundary condition is applied to take wave propagation in the infinite region surrounding the photoresist into account. The validity of the method is examined by comparing the results with those made by the vertical propagation model and the previous two- dimensional models.

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In-Ho Park, Hye-Keun Oh, and S. B. Hyun "Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310741

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