29 June 1998 Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition
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Abstract
A method for simulating latent image formation in a photoresist illuminated by an arbitrary imaging system is presented. The perfectly matched layer absorbing boundary condition is applied to take wave propagation in the infinite region surrounding the photoresist into account. The validity of the method is examined by comparing the results with those made by the vertical propagation model and the previous two- dimensional models.
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In-Ho Park, In-Ho Park, Hye-Keun Oh, Hye-Keun Oh, S. B. Hyun, S. B. Hyun, } "Reformulation for latent image formation model in photolithography using numerical absorbing boundary condition", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310741; https://doi.org/10.1117/12.310741
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