29 June 1998 Use of melting inorganic photoresist for microlens array fabrication
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Abstract
In this paper, we will show that it is possible to generate very small lenses by melting islands of inorganic photoresist on a glass substrate. The inorganic photoresist composited by us is suitable to be exposed by Electron Beam (EBE) or X-Ray. We have obtained the lithophotography pattern with 0.6 micrometer line width by EBE exposure. Because the resist pattern will not swell and distort in the developing solution, so there is no problem of shelf-life. We have made lenses with diameter ranging from 0.8 mm to 1.0 mm in the form of spheres and also have studied their optical properties.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Changtai Yu, Fengzhen Guo, Ying Chen, Hua Yu, "Use of melting inorganic photoresist for microlens array fabrication", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); doi: 10.1117/12.310804; https://doi.org/10.1117/12.310804
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