Automatic Mask And Reticle Inspection System

Hal Yang

doi:10.1117/12.933579

13 September 1982 Automatic Mask And Reticle Inspection System

Hal Yang

Proceedings Volume 0334, Optical Microlithography I: Technology for the Mid-1980s; (1982) https://doi.org/10.1117/12.933579
Event: 1982 Microlithography Conferences, 1982, Santa Clara, United States

Abstract

Automatic photomask inspection systems have been commercially available for a number of years. KLA Instruments has manufactured systems which utilize die-comparison to detect photomask defects. This paper describes some of the technical modifications and enhancements which augment the basic photomask inspection capability of a die-comparison system by adding the capability to inspect a single-die reticle against the data base which generated it.

Citation Download Citation

Hal Yang "Automatic Mask And Reticle Inspection System", Proc. SPIE 0334, Optical Microlithography I: Technology for the Mid-1980s, (13 September 1982); https://doi.org/10.1117/12.933579

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