Optical and masking properties of vacuum photoresists based on benzo[a]phenoxazine derivatives

Vladimir Enokovich Agabekov; Olga Evgenyevna Ignasheva

doi:10.1117/12.301422

1 January 1998 Optical and masking properties of vacuum photoresists based on benzo[a]phenoxazine derivatives

Vladimir Enokovich Agabekov, Olga Evgenyevna Ignasheva

Proceedings Volume 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media; (1998) https://doi.org/10.1117/12.301422
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation

Abstract

The influence of film chemical structure and surface modification with P+ ions on optical and masking properties of vacuum-deposited dye films based on benzo[a]phenoxazine derivatives were investigated. Relationship of implantation conditions, surface chemical structure, modified layer thickness and film optical properties was studied. The drastic change of film optical and masking properties in the result of ion implantation is caused by the formation of surface modified layer.

Citation Download Citation

Vladimir Enokovich Agabekov and Olga Evgenyevna Ignasheva "Optical and masking properties of vacuum photoresists based on benzo[a]phenoxazine derivatives", Proc. SPIE 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media, (1 January 1998); https://doi.org/10.1117/12.301422

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