1 January 1998 Photochemical processes in photoresists containing electron donor molecules
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Abstract
It is shown that the addition of donors (D) into resists composition based on novolac resin and diazonaphthoquinone sulfonate (DQS) ensures the linear increase quantum yield of the DQS decomposition and the light-sensitivity of resist when the ionization potential of a donor decreases. These facts are explained by the exciplex D(DQS)* formation and its subsequent dissociation on unstable D+ and (DQS)- radical ions transforming into indene carboxylic acid.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Antonina D. Grishina, Antonina D. Grishina, Anatoly V. Vannikov, Anatoly V. Vannikov, Galina O. Khazova, Galina O. Khazova, Marine G. Tedoradze, Marine G. Tedoradze, Yurij I. Koltsov, Yurij I. Koltsov, } "Photochemical processes in photoresists containing electron donor molecules", Proc. SPIE 3347, Optical Information Science and Technology (OIST97): Optical Recording Mechanisms and Media, (1 January 1998); doi: 10.1117/12.301424; https://doi.org/10.1117/12.301424
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