10 March 1998 Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography
Author Affiliations +
Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998); doi: 10.1117/12.302473
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation
Abstract
The results of 2D multiple-levels phase holographic high efficiency laser beam-splitters computer design and fabrication using direct E-beam phase relief recording in E- resist layer, chemical and reactive ion etching processing are described. The good agreement between theory predictions and the performance of fabricated splitters for a visible range of waves is observed.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrei L. Mikaelian, Sergei A. Prokopenko, Aleksandr N. Palagushkin, "Fabrication of 2D multilevel phase holographic beamsplitters using e-beam lithography", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302473; https://doi.org/10.1117/12.302473
PROCEEDINGS
7 PAGES


SHARE
KEYWORDS
Diffraction

Diffractive optical elements

Holography

Reactive ion etching

Laser development

Electron beam lithography

Chemical elements

Back to Top