10 March 1998 Fabrication of multilevel HOEs using direct e-beam writing
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Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998); doi: 10.1117/12.302511
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation
Abstract
The paper describes the method of HOE fabrication using direct exposure-controlled e-beam writing of binary and multilevel phase reliefs in a resist layer. Beamsplitters with diffraction efficiency of over 70% have been made using this technique.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Aleksandr N. Palagushkin, M. V. Politov, Sergei A. Prokopenko, Andrei L. Mikaelian, A. N. Arlamenkov, Boris S. Kiselyov, Vladimir A. Shkitin, "Fabrication of multilevel HOEs using direct e-beam writing", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302511; https://doi.org/10.1117/12.302511
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KEYWORDS
Beam splitters

Diffraction

Etching

Glasses

Holographic optical elements

Phase shifts

Plasma etching

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