10 March 1998 New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution
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Proceedings Volume 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing; (1998); doi: 10.1117/12.302470
Event: Optical Information Science and Technology, 1997, Moscow, Russian Federation
Abstract
Diffractive optical elements (DOEs), especially those used in imaging systems, often have phase distributions of rotational symmetry. A metal mask is designed such that it has different open slit angles on different radii, and the angle on a specific radius is inversely proportional to the phase magnitude there. The substrate is placed immediately under this mask and rotated relative to it during ion etching. The amount of etching on different radii of the substrate is thus modulated by the mask, and the DOE is produced in a single step. Experiments show that this is a practical and low-cost manufacture method when the phase variation along the radius is not too rapid.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yongtian Wang, Fang Cui, Yunan Sun, Dazun Zhao, "New approach for the fabrication of diffractive optical elements with rotationally symmetric phase distribution", Proc. SPIE 3348, Optical Information Science and Technology (OIST97): Computer and Holographic Optics and Image Processing, (10 March 1998); doi: 10.1117/12.302470; https://doi.org/10.1117/12.302470
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KEYWORDS
Etching

Diffractive optical elements

Photomasks

Ions

Imaging systems

Optical alignment

Ion beams

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