11 September 1998 Micromachined silicon deformable mirror
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Abstract
A new silicon deformable mirror design is presented which provides high reflectivity, an optical quality continuous surface, and high intensity handling capacity. Its features make it useful for a wide range of devices including telescopes, leasers, and photolithographic systems. The mirror architecture is similar to commercial electrostrictive deformable mirrors. A focus corrector built using this architecture exhibited 2.25 microns of actuation at the center through the application of 100v corresponding to a radius of curvature of -2.4m. A 30 micrometers thick 1cm diameter silicon mirrors exhibited its first mechanical resonance at 2.7kHz. A mirror coated with 100nm of gold was shown to be able to withstand 100kW/cm2 of continuous wave 1064nm intensity for 10 minutes without observable degradation. An active mode-matching experiment was performed showing that 99.5 percent of a Nd:YAG beam could be coupled to a finesse 4000 ring cavity.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Justin D. Mansell, Justin D. Mansell, Robert L. Byer, Robert L. Byer, } "Micromachined silicon deformable mirror", Proc. SPIE 3353, Adaptive Optical System Technologies, (11 September 1998); doi: 10.1117/12.321668; https://doi.org/10.1117/12.321668
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