21 August 1998 Micromachined silicon diffraction gratings for infrared spectroscopy
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Abstract
Micromachined silicon gratings offer two great advantages to astronomical spectroscopy in the IR: (1) Photolithographic processing techniques permit the production of gratings with much larger groove constants than are possible with conventional wavelength coverage, despite the relatively small format of IR arrays. (2) One can use anisotropic etching to form gratings on dielectric wedges. By illuminating the grating through the dielectric, we can achieve higher spectral resolution for a given grating size or a smaller grating for a given desired resolution. We discuss the technical challenges involved in micromachining large grating grooves over large areas while holding positional accuracy to very tight tolerances. Manufacturing issues include material choices, surface preparation, and chemical and physical effects during processing. We also discuss our program for evaluation of the finished products, show result of measurements we have made on front-surface and immersion devices, and use these result to assess the potential of these devices for real-world astronomical applications.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel T. Jaffe, Daniel T. Jaffe, Luke D. Keller, Luke D. Keller, Oleg A. Ershov, Oleg A. Ershov, "Micromachined silicon diffraction gratings for infrared spectroscopy", Proc. SPIE 3354, Infrared Astronomical Instrumentation, (21 August 1998); doi: 10.1117/12.317263; https://doi.org/10.1117/12.317263
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