Optical study on microstructure of laser-deposited Si-containing films

Sergey V. Svechnikov; E. B. Kaganovich; E. G. Manoilov; A. A. Kudryavtsev; Ivan Z. Indutnyi

doi:10.1117/12.306192

20 April 1998 Optical study on microstructure of laser-deposited Si-containing films

Sergey V. Svechnikov, E. B. Kaganovich, E. G. Manoilov, A. A. Kudryavtsev, Ivan Z. Indutnyi

Proceedings Volume 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997; (1998) https://doi.org/10.1117/12.306192
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1997, Kiev, Ukraine

Abstract

Optical properties of films obtained by reactive pulse laser deposition of monocrystalline Si have been studied. Transmissivity and reflectivity of these films were measured and used for calculation of their optical constants spectra. The dependencies of the spectra on reactive gas composition and pressure during sputtering let to conclude that the films prepared are composite structures containing at least two phases: SiO_xN_y matrix and nanocrystalline Si- particles embedded in it.

Citation Download Citation

Sergey V. Svechnikov, E. B. Kaganovich, E. G. Manoilov, A. A. Kudryavtsev, and Ivan Z. Indutnyi "Optical study on microstructure of laser-deposited Si-containing films", Proc. SPIE 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997, (20 April 1998); https://doi.org/10.1117/12.306192

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