20 April 1998 Study of optical properties of layered systems by multiangle ellipsometry
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Proceedings Volume 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997; (1998) https://doi.org/10.1117/12.306269
Event: International Conference on Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics, 1997, Kiev, Ukraine
Abstract
The authors discuss the possibility of studying the optical properties of multilayer films using multiangle ellipsometry. The investigation was carried out on W/Si metal superlattice produced by high-frequency sputtering deposition. The effective optical constants nf and kf were analyzed as a function of the superlattice period in the framework of the theory of optical properties of multilayer systems. The optic response of the W/Si system was simulated based on the approximations from the theory of the effective medium including the interfacial layer in the model. In the analysis use was made of the dielectric functions of the W and the Si films determined separately.
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Lubov A. Zabashta, Lubov A. Zabashta, } "Study of optical properties of layered systems by multiangle ellipsometry", Proc. SPIE 3359, Optical Diagnostics of Materials and Devices for Opto-, Micro-, and Quantum Electronics 1997, (20 April 1998); doi: 10.1117/12.306269; https://doi.org/10.1117/12.306269
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