23 October 1998 MMVF mastering for exposure processes and simulation
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Proceedings Volume 3401, Optical Data Storage '98; (1998) https://doi.org/10.1117/12.327943
Event: Optical Data Storage '98, 1998, Aspen, CO, United States
Abstract
For realizing 5.2 GB/side recording capacity Multimedia video file (MMVF), we have been developing mastering technologies, which is requested to fabricate the fine preformat patterns (L/G pitch 0.578 micrometer, minimum pit length 0.39 micrometer), optimizing exposure processes through the verification by simulation technique. With an optimized, i.e. elliptical exposure beam profile, 2T pits of minimum pit length for ideal resolution by simulation can be fabricated. Optimizing the exposure beam shift makes it possible to easily fabricate a header whose shift difference from ideal shift (0.289 micrometer) is much smaller than the plus or minus 0.05 micrometer difference that begins to decrease prepit amplitude.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Masaru Mukaida, Yuji Chaki, Shinichi Katsuda, "MMVF mastering for exposure processes and simulation", Proc. SPIE 3401, Optical Data Storage '98, (23 October 1998); doi: 10.1117/12.327943; https://doi.org/10.1117/12.327943
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