29 June 1998 Present and future trends in excimer-laser-based microlithography
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Proceedings Volume 3403, International Conference on Atomic and Molecular Pulsed Lasers II; (1998) https://doi.org/10.1117/12.311947
Event: International Conference on Atomic and Molecular Pulsed Lasers, 1997, Tomsk, Russian Federation
Abstract
Optical microlithography is continuing to play a key role in the fabrication of feature sizes in the 0.25 - 0.1 micrometers regime as the semiconductor industry enters manufacturing of the gigabit chip generation. Several important advances in technologies are needed to achieve this goal. These include the use of excimer lasers and optical resolution enhancement schemes, which will be addressed in this work.
© (1998) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Frank K. Tittel, Frank K. Tittel, Miklos Erdelyi, Miklos Erdelyi, Zoltan L. Horvath, Zoltan L. Horvath, Armen Kroyan, Armen Kroyan, William L. Wilson, William L. Wilson, Michael C. Smayling, Michael C. Smayling, Zsolt Bor, Zsolt Bor, Gabor Szabo, Gabor Szabo, } "Present and future trends in excimer-laser-based microlithography", Proc. SPIE 3403, International Conference on Atomic and Molecular Pulsed Lasers II, (29 June 1998); doi: 10.1117/12.311947; https://doi.org/10.1117/12.311947
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